PLAN(ID:7941/)

Layout/Pattern language from IBM, created as a set of Macro extensions to DPS and ported to the IBM 1130

Grace et Al IBM 1968
Related languages
DPS => PLAN   Extension of
References:
  • Grace, F. E. "A pattern generator system?hardward/software" Proceedings of the 5th Annual ACM IEEE Design Automation Conference Washington, D. C., United States 1968 pp11.1-11.14 view details Abstract: This report describes an automated pattern-generating system in which input is a uniquely defined pattern (usually a printed circuit board) described in one of two ways: 1. A drawing, which does not need to be to scale. 2. A description in nonpictorial terms such as a list of line end points and land coordinates, an algorithmic statement such as "a set of twenty 5 - mil centers thirty inches long," or other understandable and unique description. Extract: PLAN and DPS
    Software has been provided to translate artwork requirements into commands for various models of plotters using a variety of computers. 12 Computer output is magnetic or paper tape, which is used as input to the off-line plotter.
    A Type II application program for the 1130, called 1130 Data Presentation System (ii30-CX-14X), existed for the 1627 plotter as the on-line output device. A feature of DPS is its three-level implementation. Level I provides character and line generator routines that issue commands to the plotter.
    Level II performs special functions, such as curve fitting, line class or scale generation, and labeling and arc segment generation. Level II output can be a call to other routines in Levels I or II or may return results to the calling program. Level III is the highest support level, known as the Graphic Report Generator. It is designed to permit people without previous programming experience to produce a wide variety of graphic output from data files that might not even have been prepared for plotting purposes. Another feature of DPS is the Level III command, ADD MACRO, which pernnits repetitive plotting of commonly used pattern elements. The element needs to be defined only once and can subsequently be called by name. The MACRO may be defined with variable elements to be provided at execution time. Thus, the element can be stretched, rotated, or otherwise altered by command specification at Level III.
    These two features permit a user'shop such as ours to change or add output devices with Level I and some Level II reprogramming (no retraining for operators) and to create a job-oriented set of commands constituting a "shop language" from which complex patterns can be constructed. It was decided to use the Data Presentation System to support the 1130/Gerber 532 hardware. The software task can be described as a three-section task.

    i. Using 1130 assembler language, create a control program to deal with I/O traffic and transform DPS Level I output into the Gerber 500 controller format.
    Ii Translate the necessary Level I and Level II modules to accommodate the extended plotter command set (aperture commands added to pen up/down, for example) and to compute the proper command elements.
    iii Create a Level III command set corresponding to the shop language, assist in defining this language given the job mix, and implement the commands with appropriate additional MACROS.

    The first of the above tasks required knowledge of 1130 assembler language and the 1130 Functional Characteristfcs Manual. All of the tasks required knowledge of the DPS user's Manual, Operator's Manual, and System Manual.